NXP PSMN130-200D: A High-Performance 200V, 3mΩ MOSFET for Demanding Power Applications

Release date:2026-05-12 Number of clicks:179

NXP PSMN130-200D: A High-Performance 200V, 3mΩ MOSFET for Demanding Power Applications

The relentless pursuit of higher efficiency, greater power density, and enhanced reliability in power electronics drives the continuous innovation in semiconductor technology. At the forefront of this innovation is the NXP PSMN130-200D, a 200V N-channel MOSFET that sets a new benchmark for performance in demanding applications. Engineered with NXP's advanced TrenchMOS technology, this device combines an ultra-low typical on-resistance (RDS(on)) of just 3.0 mΩ with a robust 200V drain-source voltage rating, making it an exceptional choice for designers pushing the limits of power conversion systems.

A key highlight of the PSMN130-200D is its exceptional efficiency. The incredibly low RDS(on) minimizes conduction losses, which are a primary source of heat generation and energy waste in power switches. This is particularly critical in high-current applications, where even a small reduction in resistance translates to significant gains in overall system efficiency and thermal performance. The low on-resistance is achieved without compromising switching characteristics, allowing for high-frequency operation that enables smaller, more compact magnetic components and filters.

The MOSFET's 200V voltage rating provides a comfortable margin for operation in common industrial and automotive environments, such as 48V battery systems and telecom rectifiers, enhancing system robustness and protection against voltage spikes. Housed in a low-inductance, surface-mount LFPAK88 package, the device is optimized for switching performance. This package not only offers superior thermal characteristics, dissipating heat more effectively than standard packages, but also contributes to higher reliability by minimizing parasitic inductance that can cause voltage overshoot and electromagnetic interference (EMI).

The PSMN130-200D is ideally suited for a wide array of high-demand applications. These include:

Server and Telecom Power Supplies: Where efficiency standards like 80 Plus Titanium demand minimal losses.

Industrial Motor Drives and DC-DC Converters: Benefitting from low heat generation and high power density.

Solar Inverters and Energy Storage Systems: Requiring robust and efficient switching components.

Automotive Systems: Such as electric vehicle (EV) charging stations and 48V mild-hybrid systems.

ICGOOODFIND: The NXP PSMN130-200D stands out as a premier power MOSFET, delivering a winning combination of ultra-low 3mΩ RDS(on), a high 200V breakdown voltage, and a superior package. It is a transformative component for engineers aiming to achieve unprecedented levels of efficiency and power density in their next-generation designs.

Keywords: Ultra-low RDS(on), High Power Density, LFPAK88 Package, 200V MOSFET, Power Efficiency.

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